JPH0325402Y2 - - Google Patents
Info
- Publication number
- JPH0325402Y2 JPH0325402Y2 JP1985135649U JP13564985U JPH0325402Y2 JP H0325402 Y2 JPH0325402 Y2 JP H0325402Y2 JP 1985135649 U JP1985135649 U JP 1985135649U JP 13564985 U JP13564985 U JP 13564985U JP H0325402 Y2 JPH0325402 Y2 JP H0325402Y2
- Authority
- JP
- Japan
- Prior art keywords
- ring
- substrate
- block body
- shaped
- substrate holding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985135649U JPH0325402Y2 (en]) | 1985-09-06 | 1985-09-06 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985135649U JPH0325402Y2 (en]) | 1985-09-06 | 1985-09-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6244433U JPS6244433U (en]) | 1987-03-17 |
JPH0325402Y2 true JPH0325402Y2 (en]) | 1991-06-03 |
Family
ID=31038036
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985135649U Expired JPH0325402Y2 (en]) | 1985-09-06 | 1985-09-06 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0325402Y2 (en]) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60112691A (ja) * | 1983-11-18 | 1985-06-19 | Anelva Corp | 分子線エピタキシャル成長装置用の基板保持装置 |
-
1985
- 1985-09-06 JP JP1985135649U patent/JPH0325402Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS6244433U (en]) | 1987-03-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH0410529A (ja) | サセプタ及びウエーハ自動脱着装置 | |
JPH0298923A (ja) | 薄い基板用の支持装置 | |
US11946158B2 (en) | Apparatus for growing a semiconductor wafer and associated manufacturing process | |
JPH0325402Y2 (en]) | ||
ATE319185T1 (de) | Anordnung zum tragen eines substrates während eines angepassten schneidverfahrens | |
JP5101979B2 (ja) | ブレードケース | |
JP5017621B2 (ja) | サファイヤ基板とその製造方法 | |
JP3325389B2 (ja) | 電子顕微鏡の試料装置 | |
JPS6318618A (ja) | サセプタ−用カバ− | |
JPH10273399A (ja) | 組立式ウエハ用ボート及びその取付治具 | |
JPS6359329U (en]) | ||
JP2835861B2 (ja) | サセプター | |
JPH0614477Y2 (ja) | ダミーウェハ | |
JPS5917899Y2 (ja) | ウエハホルダ | |
JPH0758190A (ja) | 基板固定治具 | |
CN213327825U (zh) | 一种清理mocvd上喷淋头的工具 | |
JPH07142561A (ja) | ウエハの保持装置 | |
JPH0745563Y2 (ja) | 薄膜加工装置における基板ホルダー | |
JPH04188720A (ja) | 気相成長用サセプタのエッチング方法 | |
JPS6321577Y2 (en]) | ||
JPS6141235Y2 (en]) | ||
JPS61290009A (ja) | キヤリア治具 | |
JPS61136674A (ja) | 気相反応装置 | |
JPH069489Y2 (ja) | ウエハ支持具の載置台 | |
JPS60117736A (ja) | ベ−パ−エッチング方法 |